Semiconductor memory device

ABSTRACT

According to one embodiment, a semiconductor memory device includes a first conductive layer, a first semiconductor body, a second semiconductor body, a first memory layer, and a second memory layer. The first conductive layer includes first to fourth extension regions, and a first connection region. The first extension region extends in a first direction. The second extension region extends in the first direction and is arranged with the first extension region in the first direction. The third extension region extends in the first direction and is arranged with the first extension region in a second direction crossing the first direction. The fourth extension region extends in the first direction, is arranged with the third extension region in the first direction, and is arranged with the second extension region in the second direction.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromU.S. Provisional Patent Application 62/393,835, filed on Sep. 13, 2016;the entire contents of which are incorporated herein by reference.

FIELD

Embodiments described LATER relate generally to a semiconductor memorydevice.

BACKGROUND

It is desirable to reduce the device surface area of a semiconductormemory device.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A to FIG. 1D are schematic views illustrating a semiconductormemory device according to a first embodiment;

FIG. 2 is a schematic plan view illustrating another semiconductormemory device according to the first embodiment;

FIG. 3 is a schematic plan view illustrating another semiconductormemory device according to the first embodiment;

FIG. 4 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 5A to FIG. 5D are schematic views illustrating a semiconductormemory device according to a second embodiment;

FIG. 6 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 7 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 8 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 9 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 10 is schematic views illustrating a semiconductor memory deviceaccording to a second embodiment;

FIG. 11 is schematic views illustrating another semiconductor memorydevice according to the second embodiment;

FIG. 12 is schematic views illustrating another semiconductor memorydevice according to the second embodiment;

FIG. 13 is schematic views illustrating another semiconductor memorydevice according to the second embodiment;

FIG. 14 is schematic views illustrating another semiconductor memorydevice according to the second embodiment;

FIG. 15A to FIG. 15D are schematic views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 16 is schematic plan views illustrating another semiconductormemory device according to the second embodiment;

FIG. 17A to FIG. 17H are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 18A to FIG. 18H are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 19A to FIG. 19H are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 20A to FIG. 20C are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 21A and FIG. 21B are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment;

FIG. 22 is a schematic cross-sectional view illustrating thesemiconductor memory device according to the embodiment; and

FIG. 23 is a schematic perspective view illustrating the semiconductormemory device according to the embodiment.

DETAILED DESCRIPTION

According to one embodiment, a semiconductor memory device includes afirst conductive layer, a first semiconductor body, a secondsemiconductor body, a first memory layer, and a second memory layer. Thefirst conductive layer includes first to fourth extension regions, and afirst connection region. The first extension region extends in a firstdirection. The second extension region extends in the first directionand is arranged with the first extension region in the first direction.The third extension region extends in the first direction and isarranged with the first extension region in a second direction crossingthe first direction. The fourth extension region extends in the firstdirection, is arranged with the third extension region in the firstdirection, and is arranged with the second extension region in thesecond direction. The first connection region is connected to a portionbetween the first extension region and the second extension region andto a portion between the third extension region and the fourth extensionregion. The first semiconductor body extends through the first extensionregion along a third direction crossing the first direction and thesecond direction. The second semiconductor body extends through thethird extension region along the third direction. The first memory layeris provided between the first semiconductor body and the first extensionregion. The second memory layer is provided between the secondsemiconductor body and the third extension region.

Various embodiments will be described hereinafter with reference to theaccompanying drawings.

The drawings are schematic and conceptual; and the relationships betweenthe thickness and width of portions, the proportions of sizes amongportions, etc., are not necessarily the same as the actual valuesthereof. Further, the dimensions and proportions may be illustrateddifferently among drawings, even for identical portions.

In the specification and drawings, components similar to those describedor illustrated in a drawing thereinabove are marked with like referencenumerals, and a detailed description is omitted as appropriate.

First Embodiment

FIG. 1A to FIG. 1D are schematic views illustrating a semiconductormemory device according to a first embodiment.

FIG. 1A is a perspective view. FIG. 1B is a plan view. FIG. 1C and FIG.1D are cross-sectional views.

As shown in FIG. 1A, the semiconductor memory device 110 according tothe embodiment includes a first conductive layer 21A, a firstsemiconductor body 50A, a second semiconductor body 50B, a first memorylayer 54A, and a second memory layer 54B.

As shown in FIG. 1A and FIG. 1B, the first conductive layer 21A includesfirst to fourth extension regions 21 a to 21 d and a first connectionregion cr1. The first extension region 21 a extends in a direction.

The direction is taken as an X-axis direction. One axis perpendicular tothe X-axis direction is taken as a Y-axis direction. A directionperpendicular to the X-axis direction and the Y-axis direction is takenas a Z-axis direction.

The second extension region 21 b is arranged with the first extensionregion 21 a in the X-axis direction. The second extension region 21 bextends in the X-axis direction.

The third extension region 21 c is arranged with the first extensionregion 21 a in an other direction crossing the X-axis direction. In theexample, the other direction is the Y-axis direction. The thirdextension region 21 c extends in the X-axis direction.

The fourth extension region 21 d is arranged with the third extensionregion 21 c in the X-axis direction and arranged with the secondextension region 21 b in the Y-axis direction. The fourth extensionregion 21 d extends in the X-axis direction.

The first connection region cr1 is connected to a portion p1 between thefirst extension region 21 a and the second extension region 21 b and toa portion p2 between the third extension region 21 c and the fourthextension region 21 d. For example, the first connection region cr1extends along the Y-axis direction.

Thus, a first band-like portion that includes the first extension region21 a and the second extension region 21 b and a second band-like portionthat includes the third extension region 21 c and the fourth extensionregion 21 d are connected to each other at intermediate portions of thefirst band-like portion and the second band-like portion. The connectionis performed by the first connection region cr1.

The first semiconductor body 50A extends through the first extensionregion 21 a along a further other direction crossing the X-axisdirection and the Y-axis direction. In the example, the further otherdirection is the Z-axis direction.

The second semiconductor body 50B extends through the third extensionregion 21 c along the Z-axis direction.

As shown in FIG. 1C, the first memory layer 54A is provided between thefirst semiconductor body 50A and the first extension region 21 a.

As shown in FIG. 1D, the second memory layer 54B is provided between thesecond semiconductor body 50B and the third extension region 21 c.

Multiple semiconductor bodies 50 are provided in the semiconductormemory device 110. One of the multiple semiconductor bodies 50corresponds to the first semiconductor body 50A; and one othercorresponds to the second semiconductor body 50B. Multiple memory layers54 are provided respectively between the conductive layer (the firstconductive layer 21A) and the multiple semiconductor bodies 50. One ofthe multiple memory layers 54 corresponds to the first memory layer 54A;and one other corresponds to the second memory layer 54B.

One semiconductor body 50 and one memory layer 54 form one pillar-shapedstructure body MP. For example, a first pillar-shaped structure body MP1includes the first semiconductor body 50A and the first memory layer54A. A second pillar-shaped structure body MP2 includes the secondsemiconductor body 50B and the second memory layer 54B.

In the example, the semiconductor body 50 has a tubular configuration. Acore insulating portion 55 that extends in the Z-axis direction may beprovided inside the semiconductor body 50.

For example, the memory layer 54 has a tubular configuration. Forexample, the first memory layer 54A includes a memory film 54 c, a firstmemory insulating film 54 a, and a second memory insulating film 54 b.The first memory insulating film 54 a is provided between the memoryfilm 54 c and the first conductive layer 21A (the first extension region21 a). The second memory insulating film 54 b is provided between thememory film 54 c and the first semiconductor body 50A. The second memorylayer 54B has a configuration similar to that of the first memory layer54A; and a description is therefore omitted.

A memory cell MC (a memory transistor) is formed at the portion wherethe semiconductor body 50 and the conductive layer (e.g., the firstconductive layer 21A) cross. For example, the conductive layer (e.g.,the first conductive layer 21A) functions as a word line. For example,an end of the semiconductor body 50 is connected to a bit line (notillustrated in the drawing). For example, the other end of thesemiconductor body 50 is connected to a source line (not illustrated inthe drawing).

For example, the first memory insulating film 54 a functions as ablocking insulating film. For example, the second memory insulating film54 b functions as a tunneling insulating film. These insulating filmsinclude, for example, silicon oxide, etc. For example, the memory film54 c functions as a charge storage layer. In such a case, the memoryfilm 54 c includes, for example, silicon nitride, etc. The memory film54 c may be a floating gate (a floating electrode). In such a case, thememory film 54 c includes, for example, polysilicon, etc. The thresholdof the memory transistor changes according to the amount of the chargestored in the memory film 54 c. The difference (the change) of thethreshold corresponds to the information that is stored.

In the example as shown in FIG. 1A and FIG. 1B, the first conductivelayer 21A further includes other extension regions 21 ye to 21 yh. Theseextension regions extend in the X-axis direction. The band-like portionsthat include the extension regions are connected by connection regions.For example, the portion p2 recited above and a portion py3 between theextension region 21 ye and the extension region 21 yf are connected by aconnection region cy2. The portion py3 recited above and a portion py4between the extension region 21 yg and the extension region 21 yh areconnected by a connection region cy3. A third pillar-shaped structurebody MP3 that extends through the extension region 21 ye in the Z-axisdirection is provided; and a fourth pillar-shaped structure body MP4that extends through the extension region 21 yg in the Z-axis directionis provided.

A first connecting body 81 a (e.g., a contact electrode or the like) isprovided as shown in FIG. 1A. The first connecting body 81 a extends inthe Z-axis direction. In the example, the first connecting body 81 a iselectrically connected to the second extension region 21 b. For example,in the Z-axis direction, the first connecting body 81 a overlaps thesecond extension region 21 b. The first connecting body 81 a may beelectrically connected to the first conductive layer 21A; and the firstconnecting body 81 a may be connected to another extension region.

In the embodiment, the multiple extension regions that extend in theX-axis direction are connected to each other by the connection regions.Thereby, for example, the electrical connection to the multipleextension regions is possible by connecting a connecting body (e.g., thefirst connecting body 81 a or the like) to one of the multiple extensionregions. Thereby, the surface area of the connection region forproviding the connecting bodies can be reduced. According to theembodiment, for example, a semiconductor memory device can be providedin which a reduction of the device surface area is possible. Themultiple extension regions that are connected to each other by theconnection regions correspond to one “block.”

In the example, structure bodies that include insulating portions areprovided between the band-like portions. Namely, the semiconductormemory device 110 further includes a first structure body SB1 and asecond structure body SB2. The first structure body SB1 includes a firstextension insulating region ERi1. The first extension insulating regionERi1 is provided between the first extension region 21 a and the thirdextension region 21 c and extends in (the X-axis direction. The secondstructure body SB2 includes a second extension insulating region ERi2.The second extension insulating region ERi2 is provided between thesecond extension region 21 b and the fourth extension region 21 d andextends in the X-axis direction. As described below, these extensioninsulating regions may have plate configurations along the X-Z plane.These extension insulating regions include, for example, silicon oxide.

In the example, extension insulating regions are provided also betweenthe other band-like portions. Namely, multiple structure bodies SB areprovided respectively between the third extension region 21 c and theextension region 21 ye, between the fourth extension region 21 d and theextension region 21 yf, between the extension region 21 ye and theextension region 21 yg, and between the extension region 21 yf and theextension region 21 yh. Each of these structure bodies SB includes theextension insulating region ERi.

In the example, conductive layers 21L and 21M that are adjacent to thefirst conductive layer 21A (the word line) are illustrated. Theconductive layers 21L and 21M also function as other word lines. In theexample, a conductive portion 57A is provided between the firstconductive layer 21A and the conductive layer 21L. Also, a conductiveportion 57B is provided between the first conductive layer 21A and theconductive layer 21M. For example, these conductive portions 57A and 57Bhave plate configurations spreading along the X-Z plane. An end of eachof these conductive portions is electrically connected to a conductivemember (a not-illustrated semiconductor substrate, etc.). Also, anotherend of each of these conductive portions is electrically connected to,for example, the source line (not illustrated). The source line and thesemiconductor bodies 50 are electrically connected to each other viathese conductive portions.

In the example, an insulating portion 57 iAa is provided between theconductive portion 57A and the first conductive layer 21A. An insulatingportion 57 iAb is provided between the conductive portion 57A and theconductive layer 21L. An insulating portion 57 iBa is provided betweenthe conductive portion 57B and the first conductive layer 21A. Aninsulating portion 57 iBb is provided between the conductive portion 57Band the conductive layer 21M.

A “replacement method” such as that recited below may be used in themanufacture of the stacked body SB included in the semiconductor memorydevice 110. For example, a stacked film is formed by multiply stacking afirst film (e.g., a silicon nitride film) and a second film (e.g., asilicon oxide film) alternately on a base semiconductor layer (e.g., atleast a portion of a semiconductor substrate, etc.). A hole (which maybe a slit) that extends in the Z-axis direction is formed in the stackedfilm; and the first films are removed via the hole. Conductive layersare formed by filling a conductive material into the space formed byremoving the first films. The stacked body SB is formed of theconductive layers and the second films recited above.

In the semiconductor memory device 110, for example, the first extensioninsulating region ERi1 that is included in the first structure body SB1may include a material included in the first memory layer 54A. Thesecond extension insulating region ERi2 that is included in the secondstructure body SB2 may include a material included in the first memorylayer 54A.

FIG. 2 is a schematic plan view illustrating another semiconductormemory device according to the first embodiment.

FIG. 2 is a plan view corresponding to FIG. 1B. In the othersemiconductor memory device 111 according to the embodiment as shown inFIG. 2, an extension conductive layer ERc is further provided inaddition to the extension insulating region ERi in the structure bodySB. Otherwise, the semiconductor memory device 111 is similar to thesemiconductor memory device 110; and a description is therefore omitted.

For example, the first structure body SB1 further includes a thirdextension insulating region ERi3 and a first extension conductive layerERc1 in addition to the first extension insulating region ERi1. Thethird extension insulating region ERi3 is provided between the firstextension insulating region ERi1 and the third extension region 21 c andextends in the X-axis direction. The first extension conductive layerERc1 is provided between the first extension insulating region ERi1 andthe third extension insulating region ERi3 and extends in the X-axisdirection.

For example, the second structure body SB2 further includes a fourthextension insulating region ERi4 and a second extension conductive layerERc2 in addition to the second extension insulating region ERi2. Thefourth extension insulating region ERi4 is provided between the secondextension insulating region ERi2 and the fourth extension region 21 dand extends in the X-axis direction. The second extension conductivelayer ERc2 is provided between the second extension insulating regionERi2 and the fourth extension insulating region ERi4 and extends in theX-axis direction.

The extension conductive layers ERc (the first extension conductivelayer ERc1, the second extension conductive layer ERc2, etc.) may haveplate configurations spreading in the X-Z plane.

In the example, an insulating region is provided between the extensionconductive layer ERc and the connection region. In other words, thefirst structure body SB1 further includes a first connection region-sideinsulating region EEi1. The first connection region-side insulatingregion EEi1 is provided between the first extension conductive layerERc1 and the first connection region cr1. The second structure body SB2further includes a second connection region-side insulating region EEi2.The second connection region-side insulating region EEi2 is providedbetween the second extension conductive layer ERc2 and the firstconnection region cr1.

For example, the semiconductor memory device 111 can be made by fillinga conductive material in addition to an insulating material into theslit corresponding to the structure body SB in the manufacturing methoddescribed in reference to the semiconductor memory device 110 recitedabove. In the semiconductor memory device 111, for example, at least oneof the third extension insulating region ERi3 or the fourth extensioninsulating region ERi4 may include a material included in the firstmemory layer 54A. At least one of the first connection region-sideinsulating region EEi1 or the second connection region-side insulatingregion EEi2 may include a material included in the first memory layer54A.

FIG. 3 is a schematic plan view illustrating another semiconductormemory device according to the first embodiment.

In the other semiconductor memory device 112 according to the embodimentas shown in FIG. 3, the intermediate portions of the multiple band-likeportions are connected to each other by the first connection region cr1,etc. The multiple band-like portions are further connected to each otherat other positions (e.g., end portions).

For example, the first conductive layer 21A further includes an endportion connection region crx1. The end portion connection region crx1is connected to the first extension region 21 a and the third extensionregion 21 c. Otherwise, the semiconductor memory device 112 issubstantially similar to the semiconductor memory device 110; and adescription is therefore omitted.

In a connection region CR, the first connecting body 81 a is connectedto the second extension region 21 b. For example, the portion where thefirst connecting body 81 a is connected is used as a power supplyterminal. The multiple band-like portions are connected at the endportion on the side opposite to the power supply terminal. A memoryregion MR that includes the semiconductor bodies 50 (the firstpillar-shaped structure body MP1, etc.) is provided between the powersupply terminal and the end portion connection region crx1.

For example, the position in the X-axis direction of the firstsemiconductor body 50A is between the position in the X-axis directionof the first connection region cr1 and the position in the X-axisdirection of the end portion connection region crx1.

In the semiconductor memory device 112, the multiple band-like portionsare connected to each other at a position distal to the power supplyterminal. Thereby, for example, the resistance of the band-like portions(e.g., the word lines) can be lower. For example, operations that havehigh reliability are obtained.

Second Embodiment

FIG. 4 to FIG. 10 are schematic views illustrating a semiconductormemory device according to a second embodiment.

FIG. 4 is a perspective view. FIG. 5A to FIG. 5D are plan views. FIG. 6to FIG. 10 are cross-sectional views corresponding respectively to lineA1-A2, line B1-B2, line C1-C2, line D1-D2, and line E1-E1 of FIG. 5A.

The semiconductor memory device 120 shown in these drawings furtherincludes a second conductive layer 21B, a third conductive layer 21C,and a fourth conductive layer 21D in addition to the first conductivelayer 21A, the first semiconductor body 50A, the second semiconductorbody 50B, the first memory layer 54A, and the second memory layer 54Bdescribed above.

For example, the second conductive layer 21B functions as another wordline. For example, the third conductive layer 21C and the fourthconductive layer 21D function as drain-side selection gates. In thesedrawings, two band-like portions are drawn to simplify the drawings.Similarly to the semiconductor memory device 110, three or more (e.g.,four) band-like portions may be provided in the semiconductor memorydevice 120. Other than the description recited below, the configurationdescribed in reference to the semiconductor memory device 110 isapplicable.

In the semiconductor memory device 120 as shown in FIG. 4, at least aportion of the second conductive layer 21B overlaps at least a portionof the first conductive layer 21A in the Z-axis direction. The secondconductive layer 21B includes fifth to eighth extension regions 21 e to21 h and a second connection region cr2.

The fifth extension region 21 e is separated from the first extensionregion 21 a in the Z-axis direction. The fifth extension region 21 eextends in the X-axis direction.

The sixth extension region 21 f is separated from a portion of thesecond extension region 21 b in the Z-axis direction and is arrangedwith the fifth extension region 21 e in the X-axis direction. The sixthextension region 21 f extends in the X-axis direction.

The seventh extension region 21 g is separated from the third extensionregion 21 c in the Z-axis direction and is arranged with the fifthextension region 21 e in the Y-axis direction. The seventh extensionregion 21 g extends in the X-axis direction.

The eighth extension region 21 h is separated from a portion of thefourth extension region 21 d in the Z-axis direction, is arranged withthe seventh extension region 21 g in the X-axis direction, and isarranged with the sixth extension region 21 f in the Y-axis direction.The eighth extension region 21 h extends in the X-axis direction.

The third connection region cr2 is connected to a portion p3 between thefifth extension region 21 e and the sixth extension region 21 f and to aportion p4 between the seventh extension region 21 g and the eighthextension region 21 h.

In other words, in the second conductive layer 21B, one band-likeportion that includes the fifth extension region 21 e and the sixthextension region 21 f and one other band-like portion that includes theseventh extension region 21 g and the eighth extension region 21 h areconnected by the second connection region cr2. The second connectionregion cr2 extends in the Y-axis direction.

The first semiconductor body 50A further extends through the fifthextension region 21 e along the Z-axis direction. The secondsemiconductor body 50B further extends through the seventh extensionregion 21 g along the Z-axis direction.

In the second conductive layer 21B of the semiconductor memory device120, for example, the number of connecting bodies (contact electrodes)provided in the second conductive layer 21B can be low by connecting themultiple band-like portions to each other. Thereby, for example, thesurface area of the connection region CR can be reduced.

FIG. 5A illustrates the state in which the first to fourth conductivelayers 21A to 21D overlap. FIG. 5B is a plan view of the X-Y planeincluding the first conductive layer 21A. FIG. 5C is a plan view of theX-Y plane including the second conductive layer 21B. FIG. 5D is a planview of the X-Y plane including the third conductive layer 21C and thefourth conductive layer 21D.

In the semiconductor memory device 120, for example, the first structurebody SB1 may extend between the fifth extension region 21 e and theseventh extension region 21 g (referring to FIG. 5C). The secondstructure body SB2 may extend between the sixth extension region 21 fand the eighth extension region 21 h (referring to FIG. 5C).

In the semiconductor memory device 120, for example, at least a portionof the second connection region cr2 overlaps at least a portion of thefirst connection region cr1 in the Z-axis direction (referring to FIG.4, FIG. 5B, and FIG. 5C).

As shown in FIG. 4, for example, the second conductive layer 21B isprovided on the first conductive layer 21A. The end portion of thesecond conductive layer 21B on the upper side is proximal to thesemiconductor body 50 compared to the first conductive layer 21A on thelower side. For example, the end portions of the first conductive layer21A and the second conductive layer 21B have a staircase configuration.

For example, in the first conductive layer 21A as shown in FIG. 4, thesecond extension region 21 b includes a second extension region endportion 21 be. The second extension region end portion 21 be has a sidesurface 21 bes crossing the X-axis direction. In the second conductivelayer 21B, the sixth extension region 21 f includes a sixth extensionregion end portion 21 fe. The sixth extension region end portion 21 fehas a side surface 21 fes crossing the X-axis direction.

As shown in FIG. 5B, a first distance d1 is the distance between thesecond extension region end portion 21 be and the first semiconductorbody 50A. As shown in FIG. 5C, a second distance d2 is the distancebetween the sixth extension region end portion 21 fe and the firstsemiconductor body 50A. The first distance d1 is longer than the seconddistance d2.

Similarly, in the first conductive layer 21A as shown in FIG. 4, thefourth extension region 21 d includes a fourth extension region endportion 21 de. The fourth extension region end portion 21 de has a sidesurface 21 des crossing the X-axis direction. For example, a distance d1y is the distance in the X-axis direction between the position in theX-axis direction of the fourth extension region end portion 21 de andthe position in the X-axis direction of the first semiconductor body 50A(referring to FIG. 5B). In the example, for example, the distance d1 yis substantially the same as the first distance d1. The distance d1 yis, for example, not less than 0.95 times and not more than 1.05 timesthe first distance d1.

In the second conductive layer 21B as shown in FIG. 4, the eighthextension region 21 h includes an eighth extension region end portion 21he. The eighth extension region end portion 21 he has a side surface 21hes crossing the X-axis direction. For example, a distance d2 y is thedistance in the X-axis direction between the position in the X-axisdirection of the eighth extension region end portion 21 he and theposition in the X-axis direction of the first semiconductor body 50A(referring to FIG. 5C). In the example, for example, the distance d2 yis substantially the same as the second distance d2. The distance d2 yis, for example, not less than 0.95 times and not more than 1.05 timesthe second distance d2.

An example of the third conductive layer 21C and the fourth conductivelayer 21D will now be described.

As shown in FIG. 4, the third conductive layer 21C is separated from aportion of the first extension region 21 a in the Z-axis direction. Thethird conductive layer 21C extends in the X-axis direction. The fourthconductive layer 21D is separated from a portion of the third extensionregion 21 c in the Z-axis direction. The fourth conductive layer 21Dextends in the X-axis direction.

For example, a portion of the second conductive layer 21B is disposedbetween the third conductive layer 21C and a portion of the firstconductive layer 21A. For example, a portion of the second conductivelayer 21B is disposed between the fourth conductive layer 21D and aportion of the first conductive layer 21A.

For example, a portion of the fifth extension region 21 e of the secondconductive layer 21B is positioned between the third conductive layer21C and a portion of the first extension region 21 a of the firstconductive layer 21A. A portion of the seventh extension region 21 g ofthe second conductive layer 21B is positioned between the fourthconductive layer 21D and a portion of the third extension region 21 c ofthe first conductive layer 21A.

The first semiconductor body 50A extends through the third conductivelayer 21C along the Z-axis direction. The second semiconductor body 50Bextends through the fourth conductive layer 21D along the Z-axisdirection.

One selection transistor is formed at the portion where the thirdconductive layer 21C and the first semiconductor body 50A cross. Oneother selection transistor is formed at the portion where the fourthconductive layer 21D and the first semiconductor body 50A cross. Themultiple semiconductor bodies 50 (i.e., the memory strings including themultiple memory cells MC) are selected according to the operations ofthese selection transistors.

As shown in FIG. 4 and FIG. 5A, for example, the positions in the X-axisdirection of the end portions of the third conductive layer 21C and thefourth conductive layer 21D are between the position in the X-axisdirection of the first connection region cr1 and the position in theX-axis direction of the first semiconductor body 50.

For example, the portion p1 between the first extension region 21 a andthe second extension region 21 b recited above does not overlap thethird conductive layer 21C in the Z-axis direction. The portion p2between the third extension region 21 c and the fourth extension region21 d recited above does not overlap the fourth conductive layer 21D inthe Z-axis direction. For example, as shown in FIG. 4 and FIG. 5D, thethird conductive layer 21C includes a third conductive layer end portion21Ce. The third conductive layer end portion 21Ce has a side surface21Ces crossing the X-axis direction. The fourth conductive layer 21Dincludes a fourth conductive layer end portion 21De. The fourthconductive layer end portion 21De has a side surface 21Des crossing theX-axis direction.

For example, the first distance d1 between the first semiconductor body50A and the second extension region end portion 21 be of the secondextension region 21 b (referring to FIG. 5B) is longer than a thirddistance d3 between the third conductive layer end portion 21Ce and thefirst semiconductor body 50A (referring to FIG. 5D).

For example, the distance d1 y along the X-axis direction between theposition in the X-axis direction of the fourth extension region endportion 21 de of the fourth extension region 21 d and the position inthe X-axis direction of the first semiconductor body 50A (referring toFIG. 5B) is longer than a distance dy3 along the X-axis directionbetween the position in the X-axis direction of the fourth conductivelayer end portion 21De and the position in the X-axis direction of thefirst semiconductor body 50A (referring to FIG. 5D).

As shown in FIG. 5A and FIG. 5C, for example, the first structure bodySB1 extends between the fifth extension region 21 e and the seventhextension region 21 g. For example, the second structure body SB2extends between the sixth extension region 21 f and the eighth extensionregion 21 h.

As shown in FIG. 5D, the first structure body SB1 extends between thethird conductive layer 21C and the fourth conductive layer 21D.

As shown in FIG. 4, FIG. 5A, FIG. 6, and FIG. 7, the first to fourthconnecting bodies 81 a to 81 d (e.g., the contact electrodes) areprovided. These connecting bodies extend in the Z-axis direction.

In the example, the first connecting body 81 a overlaps the secondextension region 21 b in the Z-axis direction and is electricallyconnected to the second extension region 21 b. The second connectingbody 81 b overlaps the sixth extension region 21 f in the Z-axisdirection and is electrically connected to the sixth extension region 21f. The third connecting body 81 c overlaps the third conductive layer21C in the Z-axis direction and is electrically connected to the thirdconductive layer 21C. The fourth connecting body 81 d overlaps thefourth conductive layer 21D in the Z-axis direction and is electricallyconnected to the fourth conductive layer 21D.

In the semiconductor memory device 120 as shown in FIG. 6, a stackedbody ML is provided on a base semiconductor layer 10 (e.g., at least aportion of a semiconductor substrate). The stacked body ML includesmultiple conductive layers 21 and multiple insulating layers 22 that arearranged alternately. The stacking direction corresponds to the Z-axisdirection. The Z-axis direction is substantially perpendicular to anupper surface 10 u of the base semiconductor layer 10.

Several of the multiple conductive layers 21 are used as word lines WL.One of the word lines WL corresponds to the first conductive layer 21A.One other of the word lines WL corresponds to the second conductivelayer 21B. One or a plurality of the multiple conductive layers 21corresponds to a drain-side selection gate SGD. The multiple drain-sideselection gates SGD are provided in the example. One other of themultiple conductive layers 21 corresponds to a source-side selectiongate SGS.

For example, an insulating layer 23Ai (a gate insulating film) isprovided between the first semiconductor body 50A and the source-sideselection gate SGS. An insulating layer 24Ai (a gate insulating film) isprovided between the first semiconductor body 50A and the drain-sideselection gates SGD (e.g., the third conductive layer 21C).

The end portions of the multiple conductive layers 21 have a staircaseconfiguration. Connecting bodies (e.g., the first to third connectingbodies 81 a to 81 c, etc.) are provided at the portions having thestaircase configuration.

As shown in FIG. 7, an insulating layer 23Bi (a gate insulating film) isprovided between the second semiconductor body 50B and the source-sideselection gate SGS. An insulating layer 24Bi (a gate insulating film) isprovided between the second semiconductor body 50B and the drain-sideselection gates SGD (e.g., the fourth conductive layer 21D).

The end portions of the multiple conductive layers 21 have a staircaseconfiguration. Connecting bodies (e.g., the fourth connecting body 81 d,etc.) are provided at the portions having the staircase configuration.

As shown in FIG. 8, a portion of the insulating layers 22 is providedbetween the first connection region cr1 and the second connection regioncr2.

As shown in FIG. 9, a source-side selection transistor STS is formed atthe portion where the first semiconductor body 50A and the source-sideselection gate SGS (the conductive layer 21) cross. Drain-side selectiontransistors STD are formed at the portions where the first semiconductorbody 50A and the drain-side selection gates SGD (the conductive layers21) cross. Another source-side selection transistor STS is formed at theportion where the second semiconductor body 50B and the source-sideselection gate SGS (the conductive layer 21) cross. Other drain-sideselection transistors STD are formed at the portions where the secondsemiconductor body 50B and the drain-side selection gates SGD (theconductive layers 21) cross.

The memory cells MC are formed at the portions where the firstsemiconductor body 50A and the second semiconductor body 50B cross theword lines WL (the conductive layers 21). An end of the firstsemiconductor body 50A is connected to the base semiconductor layer 10;and the other end is connected to a first interconnect WR1 (e.g., a bitline BL). An end of the second semiconductor body 50B is connected tothe base semiconductor layer 10; and the other end is connected to thefirst interconnect WR1. One of the multiple semiconductor bodies 50 isselected by the operations of the selection transistors; and theoperations of the programming, erasing, and reading are performed.

In the semiconductor memory device 120 as shown in FIG. 10, the firstconnecting body 81 a is electrically connected to an interconnect 93.

FIG. 11 to FIG. 13 are schematic views illustrating anothersemiconductor memory device according to the second embodiment.

FIG. 11 is a plan view. FIG. 12 is a line D1-D2 cross-sectional view ofFIG. 11. FIG. 13 is a line E1-E1 cross-sectional view of FIG. 11.

In the semiconductor memory device 121 shown in these drawings, thefirst structure body SB1 and the second structure body SB2 each includeconductive layers. In other words, the first structure body SB1 and thesecond structure body SB2 of the semiconductor memory device 120 havethe structures of the first structure body SB1 and the second structurebody SB2 described in reference to FIG. 2. Otherwise, the semiconductormemory device 121 is similar to the semiconductor memory device 120; anda description is therefore omitted.

For example, in the first structure body SB1, the first extensioninsulating region ERi1 is further provided between the fifth extensionregion 21 e and the seventh extension region 21 g. The third extensioninsulating region ERi3 is further provided between the first extensioninsulating region ERi1 and the seventh extension region 21 g. Betweenthe fifth extension region 21 e and the seventh extension region 21 g,the first extension conductive layer ERc1 is provided between the firstextension insulating region ERi1 and the third extension insulatingregion ERi3.

For example, in the second structure body SB2, a portion of the secondextension insulating region ERi2 is further provided between the sixthextension region 21 f and the eighth extension region 21 h. The fourthextension insulating region ERi4 is further provided between the secondextension insulating region ERi2 and the eighth extension region 21 h.Between the sixth extension region 21 f and the eighth extension region21 h, the second extension conductive layer ERc2 is provided between thesecond extension insulating region ERi2 and the fourth extensioninsulating region ERi4.

For example, the first connection region-side insulating region EEi1 ofthe first structure body SB1 is further provided between the firstextension conductive layer ERc1 and the second connection region cr2.The second connection region-side insulating region EEi2 of the secondstructure body SB2 is further provided between the second extensionconductive layer ERc2 and the second connection region cr2.

FIG. 14 and FIG. 15 are schematic views illustrating anothersemiconductor memory device according to the second embodiment.

FIG. 14 is a perspective view. FIG. 15A to FIG. 15D are plan views. Thefirst to fourth conductive layers 21A to 21D are provided in the exampleas well.

FIG. 15A illustrates the state in which the first to fourth conductivelayers 21A to 21D overlap. FIG. 15B is a plan view of the X-Y planeincluding the first conductive layer 21A. FIG. 15C is a plan view of theX-Y plane including the second conductive layer 21B. FIG. 15D is a planview of the X-Y plane including the third conductive layer 21C and thefourth conductive layer 21D.

In the semiconductor memory device 122, the lengths of the multipleextension regions (the sixth extension region 21 f and the eighthextension region 21 h) included in the second conductive layer 21B aredifferent from each other.

As shown in FIG. 14, for example, the sixth extension region 21 fincludes the sixth extension region end portion 21 fe having the sidesurface 21 fes crossing the X-axis direction. The eighth extensionregion 21 h includes the eighth extension region end portion 21 hehaving the side surface 21 hes crossing the X-axis direction.

As shown in FIG. 15C, the second distance d2 is the distance between thesixth extension region end portion 21 fe and the first semiconductorbody 50A. On the other hand, a distance dy2 is the distance in theX-axis direction between the position in the X-axis direction of theeighth extension region end portion 21 he and the position in the X-axisdirection of the first semiconductor body 50A. The second distance d2 isshorter than the distance dy2.

Thus, the distances between the semiconductor body 50 and the endportions of the multiple extension regions inside one conductive layer21 are different from each other. A connecting body is provided at oneof such multiple end portions.

For example, the first connecting body 81 a is provided as shown in FIG.14 and FIG. 15B. The first connecting body 81 a extends in the Z-axisdirection. The first connecting body 81 a is electrically connected tothe second extension region 21 b of the first conductive layer 21A. Inthis case, the second extension region 21 b includes the secondextension region end portion 21 be having the side surface 21 bescrossing the X-axis direction. The position in the X-axis direction ofthe first connecting body 81 a is between the position in the X-axisdirection of the second extension region end portion 21 be and theposition in the X-axis direction of the first semiconductor body 50A. Onthe other hand, the sixth extension region 21 f includes the sixthextension region end portion 21 fe having the side surface 21 fescrossing the X-axis direction. The position in the X-axis direction ofthe sixth extension region end portion 21 fe is between the position inthe X-axis direction of the first connecting body 81 a and the positionin the X-axis direction of the first semiconductor body 50A.

The second connecting body 81 b is further provided as shown in FIG. 14and FIG. 15C. The second connecting body 81 b extends in the Z-axisdirection and is electrically connected to the eighth extension region21 h. As described above, the sixth extension region 21 f includes thesixth extension region end portion 21 fe having the side surface 21 fescrossing the X-axis direction. The position in the X-axis direction ofthe sixth extension region end portion 21 fe is between the position inthe X-axis direction of the second connecting body 81 b and the positionin the X-axis direction of the first semiconductor body 50A. Forexample, in the second conductive layer 21B, the second connecting body81 b is provided at a long extension region.

In the semiconductor memory device 122, the multiple band-like portionsthat are included in the second conductive layer 21B are connected bythe connection region CR2. Therefore, by providing the connecting bodyfor at least one of the multiple band-like portions, the connecting bodyand the multiple band-like portions are electrically connected. Thereby,the surface area of the connection region CR for providing theconnecting bodies can be reduced.

FIG. 16, FIG. 17A to FIG. 17H, FIG. 18A to FIG. 18H, FIG. 19A to FIG.19H, and FIG. 20A to FIG. 20C are schematic plan views illustratinganother semiconductor memory device according to the second embodiment.

As shown in FIG. 16, multiple conductive layers (conductive first tothirty-second layers L1 to L32) are provided in the other semiconductormemory device 123 according to the embodiment. FIG. 17A to FIG. 17H,FIG. 18A to FIG. 18H, FIG. 19A to FIG. 19H, and FIG. 20A to FIG. 20Cillustrate each of the multiple conductive layers.

First to fourth extension regions ER1 to ER4 (referring to FIG. 17A) areprovided in each of the conductive layers. Two band-like portions areconnected partway through the band-like portions by a connection regionCNR. As shown in FIG. 17A to FIG. 17H, FIG. 18A to FIG. 18H, FIG. 19A toFIG. 19H, and FIG. 20A to FIG. 20C, the positions of the end portions ofthe multiple extension regions are different from each other between thefirst to thirty-second layers L1 to L32. The connecting bodies (first tothirty-second connecting bodies C1 to C32) that extend in the Z-axisdirection are connected respectively to the first to thirty-secondlayers L1 to L32.

In the semiconductor memory device 123, the surface area of theconnection region CR for providing the connecting bodies can be reduced.

FIG. 21A and FIG. 21B are schematic plan views illustrating anothersemiconductor memory device according to the second embodiment.

In the other semiconductor memory device 124 according to theembodiment, the multiple band-like portions are connected to each otherby the first connection region cr1, the second connection region, etc.Further, the multiple band-like portions are connected to each other atother positions (other end portions). Otherwise, the semiconductormemory device 124 is similar to the semiconductor memory device 120; anda description is therefore omitted.

As shown in FIG. 19A, for example, the first conductive layer 21Afurther includes the end portion connection region crx1 described above.The end portion connection region crx1 is connected to the firstextension region 21 a and the third extension region 21 c.

As shown in FIG. 19B, for example, the second conductive layer 21Bfurther includes an end portion connection region crx2. The end portionconnection region crx2 is connected to the fifth extension region 21 eand the seventh extension region 21 g.

For example, the position in the X-axis direction of the firstsemiconductor body 50A is between the position in the X-axis directionof the second connection region cr2 and the position in the X-axisdirection of the end portion connection region crx2.

In the semiconductor memory device 124, the multiple band-like portionsare connected to each other at a position distal to the power supplyterminal. Thereby, for example, the resistance of the band-like portions(e.g., the word line) can be lower. Operations that have highreliability are obtained.

FIG. 22 is a schematic cross-sectional view illustrating thesemiconductor memory device according to the embodiment.

FIG. 22 illustrates the memory region MR and the connection region CR ofthe semiconductor memory device according to the embodiment.

As shown in FIG. 22, the base semiconductor layer 10 (e.g., thesemiconductor substrate) is provided in the semiconductor memory device131 according to the embodiment. In the example, an insulating layer 22x is provided on the base semiconductor layer 10.

In the memory region MR, the stacked body ML is provided on theinsulating layer 22 x. Also, the semiconductor body 50, the memory layer54, and a conductive portion 57 are provided. The conductive portion 57is used as a source member. In the stacked body ML, the multipleconductive layers 21 are provided; and the insulating layers 22 areprovided between the multiple conductive layers 21. A portion of theconductive layers 21 is used as the source-side selection gate SGS(e.g., the lower selection gate). A portion of the conductive layers 21is used as the drain-side selection gate SGD (e.g., the upper selectiongate). The memory layer 54 is provided between the stacked body ML andthe semiconductor body 50.

The semiconductor body 50 is electrically connected to the basesemiconductor layer 10. The conductive portion 57 extends through thestacked body ML in the Z-axis direction. The conductive portion 57 mayspread along the Z-X plane. The semiconductor body 50 and the conductiveportion 57 are electrically connected via the base semiconductor layer10.

The conductive portion 57 includes a metal (e.g., tungsten, etc.). Theconductive portion 57 may include, for example, a semiconductor(polysilicon including an impurity, etc.). An insulating film 57 i isprovided between the conductive portion 57 and the stacked body ML.

An insulating film 71 is provided on the stacked body ML. An insulatingfilm 72 is provided on the insulating film 71. An insulating film 73 isprovided on the insulating film 72. An insulating film 74 is provided onthe insulating film 73. An insulating film 75 is provided on theinsulating film 74.

In the connection region CR, the end portions of the multiple conductivelayers 21 have a staircase configuration. A connecting body 81 (e.g., acontact plug) is provided on each of the multiple conductive layers 21.For example, the connecting body 81 has a columnar configurationextending in the Z-axis direction. The connecting body 81 iselectrically connected to one of the multiple conductive layers 21. Theconnecting body 81 includes a conductive material (e.g., tungsten,etc.). An insulating portion 66 i is provided at the periphery of theconnecting body 81.

A barrier metal film 81 f is provided between the connecting body 81 andthe insulating portion 66 i. The barrier metal film 81 f is providedalso between the connecting body 81 and the conductive layer 21electrically connected to the connecting body 81. The barrier metal film81 f is a film including a metal. The barrier metal film 81 f includes,for example, titanium. The barrier metal film 81 f may be a filmincluding titanium nitride.

In the memory region MR, a connecting body 82 is provided on thesemiconductor body 50. A connecting body 83 is provided on theconnecting body 82. For example, the multiple bit lines BL that extendin the Y-axis direction are provided on the connecting body 83. Thesemiconductor body 50 and one of the multiple bit lines BL areelectrically connected via the connecting bodies 82 and 83.

A connecting body 84 is provided on the conductive portion 57. A sourceline SL that extends in the Y-axis direction is provided on theconnecting body 84. The conductive portion 57 and the source line SL areconnected via the connecting body 84.

In the connection region CR, a connecting body 85 is provided on theconnecting body 81. For example, an interconnect 93 is provided on theconnecting body 85. The connecting body 81 and the interconnect 93 areconnected via the connecting body 85. The connecting bodies 82, 83, 84,and 85 are, for example, contact plugs.

FIG. 23 is a schematic perspective view illustrating the semiconductormemory device according to the embodiment.

In the semiconductor memory device 132 as shown in FIG. 23, the basesemiconductor layer 10 is provided in the upper portion of a siliconsubstrate 10 s; and the stacked body ML is provided on the basesemiconductor layer 10. The source-side selection transistor STS isprovided in the lower portion of the stacked body ML; and the drain-sideselection transistor STD is provided in the upper portion. The multiplepillar-shaped structure bodies MP extend through the stacked body ML.The pillar-shaped structure bodies MP include the memory layer 54 andthe semiconductor body 50. In the drawing, a slit ST is provided betweentwo stacked bodies ML; and the conductive portion 57 recited above (notillustrated in FIG. 18) is provided in the slit ST. The source line SLis not illustrated in the drawing.

In the silicon substrate 10 s, the base semiconductor layer 10 isprovided on an inter-layer insulating film ILI. The inter-layerinsulating film ILI includes, for example, silicon oxide. An under-cellcircuit UCC (e.g., a peripheral circuit) is provided in the siliconsubstrate 10 s. The under-cell circuit UCC includes a drive circuit. Forexample, the drive circuit performs the programming, reading, anderasing of the data to and from the transistors of the memory cells MC.For example, the under-cell circuit UCC includes a sense amplifier.

For example, the silicon substrate 10 s is subdivided into multipleactive areas by an insulating portion STI (Shallow Trench Isolation). Inone active area, an n-type transistor n-Tr (a MOSFET(Metal-Oxide-Semiconductor Field-Effect Transistor)) is provided. In oneother active area, a p-type transistor p-Tr (a MOSFET) is provided.Multiple interconnects ICN are provided in multilayers inside theinter-layer insulating film ILI. Further, connection members CNT1 thatconnect the multiple interconnects ICN to the silicon substrate 10 s areprovided. Further, connection members CNT2 that connect the multipleinterconnects ICN to each other are provided.

In the semiconductor memory device 132, because the under-cell circuitUCC (e.g., the peripheral circuit) is provided in the portion under thememory cells MC, the surface area of the semiconductor memory device 132can be reduced. In the semiconductor memory device 132, any embodimentrecited above or a modification of the embodiment is applicable to theconfiguration of the memory region MR.

According to the embodiments, a semiconductor memory device can beprovided in which a reduction of the device surface area is possible.

In the specification of the application, “perpendicular” and “parallel”refer to not only strictly perpendicular and strictly parallel but alsoinclude, for example, the fluctuation due to manufacturing processes,etc. It is sufficient to be substantially perpendicular andsubstantially parallel.

Hereinabove, exemplary embodiments of the invention are described withreference to specific examples. However, the embodiments of theinvention are not limited to these specific examples. For example, oneskilled in the art may similarly practice the invention by appropriatelyselecting specific configurations of components included insemiconductor memory devices such as conductive layers, insulatinglayers, memory cells, semiconductor bodies, memory layers, conductiveportions, etc., from known art. Such practice is included in the scopeof the invention to the extent that similar effects thereto areobtained.

Further, any two or more components of the specific examples may becombined within the extent of technical feasibility and are included inthe scope of the invention to the extent that the purport of theinvention is included.

Moreover, all semiconductor memory devices practicable by an appropriatedesign modification by one skilled in the art based on the semiconductormemory devices described above as embodiments of the invention also arewithin the scope of the invention to the extent that the spirit of theinvention is included.

Various other variations and modifications can be conceived by thoseskilled in the art within the spirit of the invention, and it isunderstood that such variations and modifications are also encompassedwithin the scope of the invention.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modifications as would fall within the scope andspirit of the invention.

What is claimed is:
 1. A semiconductor memory device, comprising: afirst conductive layer including a first extension region extending in afirst direction, a second extension region extending in the firstdirection and being arranged with the first extension region in thefirst direction, a third extension region extending in the firstdirection and being arranged with the first extension region in a seconddirection crossing the first direction, a fourth extension regionextending in the first direction, being arranged with the thirdextension region in the first direction, and being arranged with thesecond extension region in the second direction, and a first connectionregion connected to a portion between the first extension region and thesecond extension region and to a portion between the third extensionregion and the fourth extension region; a first semiconductor bodyextending through the first extension region along a third directioncrossing the first direction and the second direction; a secondsemiconductor body extending through the third extension region alongthe third direction; a first memory layer provided between the firstsemiconductor body and the first extension region; and a second memorylayer provided between the second semiconductor body and the thirdextension region.
 2. The semiconductor memory device according to claim1, further comprising: a first structure body including a firstextension insulating region, the first extension insulating regionextending in the first direction and being provided between the firstextension region and the third extension region; and a second structurebody including a second extension insulating region, the secondextension insulating region extending in the first direction and beingprovided between the second extension region and the fourth extensionregion.
 3. The semiconductor memory device according to claim 2, whereinthe first extension insulating region includes a material included inthe first memory layer.
 4. The semiconductor memory device according toclaim 2, wherein the first structure body further includes: a thirdextension insulating region extending in the first direction and beingprovided between the first extension insulating region and the thirdextension region; and a first extension conductive layer extending inthe first direction and being provided between the first extensioninsulating region and the third extension insulating region, and thesecond structure body further includes: a fourth extension insulatingregion extending in the first direction and being provided between thesecond extension insulating region and the fourth extension region; anda second extension conductive layer extending in the first direction andbeing provided between the second extension insulating region and thefourth extension insulating region.
 5. The semiconductor memory deviceaccording to claim 4, wherein the third extension insulating regionincludes a material included in the first memory layer.
 6. Thesemiconductor memory device according to claim 4, wherein the firststructure body further includes a first connection region-sideinsulating region provided between the first extension conductive layerand the first connection region, and the second structure body furtherincludes a second connection region-side insulating region providedbetween the second extension conductive layer and the first connectionregion.
 7. The semiconductor memory device according to claim 6, whereinthe first connection region-side insulating region includes a materialincluded in the first memory layer.
 8. The semiconductor memory deviceaccording to claim 1, wherein the first conductive layer furtherincludes an end portion connection region connected to the firstextension region and the third extension region.
 9. The semiconductormemory device according to claim 8, wherein a position in the firstdirection of the first semiconductor body is between a position in thefirst direction of the first connection region and a position in thefirst direction of the end portion connection region.
 10. Thesemiconductor memory device according to claim 1, further comprising asecond conductive layer, the second conductive layer including: a fifthextension region extending in the first direction and being separatedfrom the first extension region in the third direction; a sixthextension region extending in the first direction, being separated froma portion of the second extension region in the third direction, andbeing arranged with the fifth extension region in the first direction; aseventh extension region extending in the first direction, beingseparated from the third extension region in the third direction, andbeing arranged with the fifth extension region in the second direction;an eighth extension region extending in the first direction, beingseparated from a portion of the fourth extension region in the thirddirection, being arranged with the seventh extension region in the firstdirection, and being arranged with the sixth extension region in thesecond direction; and a second connection region connected to a portionbetween the fifth extension region and the sixth extension region and toa portion between the seventh extension region and the eighth extensionregion, the first semiconductor body further extending through the fifthextension region along the third direction, the second semiconductorbody further extending through the seventh extension region along thethird direction, a first structure body extending between the fifthextension region and the seventh extension region, a second structurebody extending between the sixth extension region and the eighthextension region.
 11. The semiconductor memory device according to claim10, wherein at least a portion of the second connection region overlapsat least a portion of the first connection region in the thirddirection.
 12. The semiconductor memory device according to claim 10,wherein the second extension region includes a second extension regionend portion having a side surface crossing the first direction, thesixth extension region includes a sixth extension region end portionhaving a side surface crossing the first direction, and a first distancebetween the second extension region end portion and the firstsemiconductor body is longer than a second distance between the sixthextension region end portion and the first semiconductor body.
 13. Thesemiconductor memory device according to claim 1, further comprising: athird conductive layer extending in the first direction and beingseparated from a portion of the first extension region in the thirddirection; and a fourth conductive layer extending in the firstdirection and being separated from a portion of the third extensionregion in the third direction, the first semiconductor body extendingthrough the third conductive layer along the third direction, the secondsemiconductor body extending through the fourth conductive layer alongthe third direction.
 14. The semiconductor memory device according toclaim 13, wherein the portion between the first extension region and thesecond extension region does not overlap the third conductive layer inthe third direction, and the portion between the third extension regionand the fourth extension region does not overlap the fourth conductivelayer in the third direction.
 15. The semiconductor memory deviceaccording to claim 13, wherein the second extension region includes asecond extension region end portion having a side surface crossing thefirst direction, the third conductive layer includes a third conductivelayer end portion having a side surface crossing the first direction,and a first distance between the second extension region end portion andthe first semiconductor body is longer than a third distance between thethird conductive layer end portion and the first semiconductor body. 16.The semiconductor memory device according to claim 13, furthercomprising a second conductive layer, the second conductive layerincluding: a fifth extension region extending in the first direction andbeing separated from the first extension region in the third direction;a sixth extension region extending in the first direction, beingseparated from a portion of the second extension region in the thirddirection, and being arranged with the fifth extension region in thefirst direction; a seventh extension region extending in the firstdirection, being separated from the third extension region in the thirddirection, and being arranged with the fifth extension region in thesecond direction; an eighth extension region extending in the firstdirection, being separated from a portion of the fourth extension regionin the third direction, being arranged with the seventh extension regionin the first direction, and being arranged with the sixth extensionregion in the second direction; and a second connection region connectedto a portion between the fifth extension region and the sixth extensionregion and to a portion between the seventh extension region and theeighth extension region, the first semiconductor body further extendingthrough the fifth extension region along the third direction, the secondsemiconductor body further extending through the seventh extensionregion along the third direction, a first structure body extendingbetween the fifth extension region and the seventh extension region, asecond structure body extending between the sixth extension region andthe eighth extension region, a portion of the fifth extension regionbeing positioned between the third conductive layer and the portion ofthe first extension region, a portion of the seventh extension regionbeing positioned between the fourth conductive layer and the portion ofthe third extension region.
 17. The semiconductor memory deviceaccording to claim 13, wherein a first structure body extends betweenthe third conductive layer and the fourth conductive layer.
 18. Thesemiconductor memory device according to claim 10, wherein the sixthextension region includes a sixth extension region end portion having aside surface crossing the first direction, the eighth extension regionincludes an eighth extension region end portion having a side surfacecrossing the first direction, and a second distance between the sixthextension region end portion and the first semiconductor body is shorterthan a distance in the first direction between a position in the firstdirection of the eighth extension region end portion and a position inthe first direction of the first semiconductor body.
 19. Thesemiconductor memory device according to claim 10, further comprising afirst connecting body extending in the third direction and beingelectrically connected to the second extension region, the secondextension region including a second extension region end portion havinga side surface crossing the first direction, a position in the firstdirection of the first connecting body being between a position in thefirst direction of the second extension region end portion and aposition in the first direction of the first semiconductor body.
 20. Thesemiconductor memory device according to claim 19, further comprising asecond connecting body extending in the third direction and beingelectrically connected to the eighth extension region, the sixthextension region including a sixth extension region end portion having aside surface crossing the first direction, the position in the firstdirection of the sixth extension region end portion being between aposition in the first direction of the second connecting body and theposition in the first direction of the first semiconductor body.